520.495/580.495 Microfabrication Laboratory
Laboratory Assignment #5
Objectives:
I) To deposit SU-8 negative photoresist.
II) To do lithography on the spun photoresist and cure it.
NOTE: We will do just TWO student wafers per section (saving the others for the individual final projects).
Preliminaries:
1. All the cleaning procedures (except using
spin/rinse/dryer) should be done in the hood. Aprons, protective sleeves,
gloves, face shield, lab coat, and goggles must be worn during cleaning
procedures. Wear plastic disposable gloves at all times.
2. Transfer wafers with tweezers; try
to grasp the wafer at the same place each time, usually at the flat edge.
I. Prelab Work:
Based on the information on the SU-8 photoresists (see our FAQ section of the course web page) prepare a lab procedure to deposit about 20 microns of SU-8 on your wafers.
II. Lab Work:
Our lab procedure will be handed out in the lab.
III. Postlab Work:
Discuss the use of SU-8 as a passivating surface for our DNA microchips (maximum of two pages with references).